Comparative studies of defect production in heavily doped silicon under fast electron irradiation at different temperatures

Author: Emtsev V.   Ehrhart P.   Poloskin D.   Emtsev K.  

Publisher: Springer Publishing Company

ISSN: 0957-4522

Source: Journal of Materials Science: Materials in Electronics, Vol.18, Iss.7, 2007-07, pp. : 711-714

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract