Rf magnetron sputtering of polytetrafluoroethylene under various conditions

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Simulation of the MO film deposition in the magnetron sputtering discharge

By Ishida M.   Yamaguchi Y.   Yamamura Y.  

Thin Solid Films, Vol. 334, Iss. 1, 1998-12 ,pp. : 225-229

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SiC film deposition by DC magnetron sputtering

By Gou L.   Qi C.   Ran J.   Zheng C.  

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Influence of deposition conditions on the properties of a-GeC:H and a-Ge:H films prepared by r.f. magnetron sputtering

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Effect of the deposition geometry on the electrical properties within Tin-doped indium oxide film deposited under a given RF magnetron sputtering condition

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