Author: Gou L. Qi C. Ran J. Zheng C.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.345, Iss.1, 1999-05, pp. : 42-44
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Deposition of TiC films by dual source dc magnetron sputtering
By Inoue S. Wada Y. Koterazawa K.
Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. :
Simulation of the MO film deposition in the magnetron sputtering discharge
By Ishida M. Yamaguchi Y. Yamamura Y.
Thin Solid Films, Vol. 334, Iss. 1, 1998-12 ,pp. :
Numerical simulation of the discharge in d.c. magnetron sputtering
By Shidoji E. Nakano N. Makabe T.
Thin Solid Films, Vol. 351, Iss. 1, 1999-08 ,pp. :