Improving the Etch Selectivity of ZrO2 Thin Films over Si by Using High Density Plasma

Author： Woo Jong-Chang   Kim Gwan-Ha   Kim Dong-Pyo   Um Doo-Seung   Kim Chang-Il  

Publisher： Taylor & Francis Ltd

ISSN： 0015-0193

Source： Ferroelectrics, Vol.384, Iss.1, 2009-01, pp. : 47-55

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