Dry Etching Mechanisms of ZrO2 Thin Films in BCl3/Cl2/Ar Plasma

Author: Lee Cheol-In   Kim Gwan-Ha   Kim Dong-Pyo   Woo Jong-Chang   Kim Chang-Il  

Publisher: Taylor & Francis Ltd

ISSN: 0015-0193

Source: Ferroelectrics, Vol.384, Iss.1, 2009-01, pp. : 32-38

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Abstract