Dry Etching Characteristics of ZrO2 Thin Films Using High Density Cl2/Ar Plasma

Author： Woo Jong-Chang   Um Doo-Seung   Kim Chang-Il  

Publisher： Taylor & Francis Ltd

ISSN： 0015-0193

Source： Ferroelectrics, Vol.407, Iss.1, 2010-01, pp. : 117-124

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