Review and Perspective of Hf-based High-k Gate Dielectrics on Silicon

Author: He Gang   Sun Zhaoqi   Li Guang   Zhang Lide  

Publisher: Taylor & Francis Ltd

ISSN: 1040-8436

Source: Critical Reviews in Solid State and Material Sciences, Vol.37, Iss.3, 2012-07, pp. : 131-157

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Abstract