Investigation of structure and composition of buried oxide layers formed by oxygen-ion implantation into silicon

Author: Patel A. P.   Yadav A. D.   Dubey S. K.   Panigrahi B. K.   Nair K. G. M.  

Publisher: Taylor & Francis Ltd

ISSN: 1042-0150

Source: Radiation Effects and Defects in Solids, Vol.164, Iss.1, 2009-01, pp. : 49-58

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Abstract