Integration of FeRAM Devices into a Standard CMOS Process-Impact of Ferroelectric Anneals on CMOS Characteristics

Author: Röhner M.   Mikolajick T.   Nagel N.   Hagenbeck R.  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.47, Iss.1, 2002-01, pp. : 61-70

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Abstract