Excellent passivation of thin silicon wafers by HF‐free hydrogen plasma etching using an industrial ICPECVD tool

E-ISSN： 1862-6270|9|1|47-52

ISSN： 1862-6254

Source： PHYSICA STATUS SOLIDI - RAPID RESEARCH LETTERS (ELECTRONIC), Vol.9, Iss.1, 2015-01, pp. : 47-52

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