Silicon Oxycarbide Thin Films by Remote Microwave Hydrogen Plasma CVD Using a Tetramethyldisiloxane Precursor

E-ISSN： 1521-3862|21|4-5-6|88-93

ISSN： 0948-1907

Source： CHEMICAL VAPOR DEPOSITION (ELECTRONIC), Vol.21, Iss.4-5-6, 2015-06, pp. : 88-93

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