Multi-eigenmode control for high material contrast in bimodal and higher harmonic atomic force microscopy

Author: Schuh Andreas   Rangelow Ivo W   Youcef-Toumi Kamal   Schuh Andreas  

Publisher: IOP Publishing

E-ISSN: 1361-6528|26|23|235706-235719

ISSN: 0957-4484

Source: Nanotechnology, Vol.26, Iss.23, 2015-06, pp. : 235706-235719

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