Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films

Publisher： John Wiley & Sons Inc

E-ISSN： 1610-1642|12|7|980-984

ISSN： 1862-6351

Source： PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol.12, Iss.7, 2015-07, pp. : 980-984

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