Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography

Publisher： John Wiley & Sons Inc

E-ISSN： 2195-1071|3|9|1248-1256

ISSN： 2195-1071

Source： ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol.3, Iss.9, 2015-09, pp. : 1248-1256

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography

By  

ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol. 2195-1071, Iss. 9, 2015-09 ,pp. : 1248-1256

John Wiley & Sons Inc

Access to resources Recommend Favorite

Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography

By  

ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol. 2, Iss. 11, 2014-11 ,pp. : 1050-1056

John Wiley & Sons Inc

Access to resources Recommend Favorite

Plasmonic Antennas: Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography (Advanced Optical Materials 11/2014)

By  

ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol. 2, Iss. 11, 2014-11 ,pp. : 1049-1049

John Wiley & Sons Inc

Access to resources Recommend Favorite

Large‐Area Low‐Cost Tunable Plasmonic Perfect Absorber in the Near Infrared by Colloidal Etching Lithography

By  

ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol. 3, Iss. 3, 2015-03 ,pp. : 398-403

John Wiley & Sons Inc

Access to resources Recommend Favorite

Repetitive Hole‐Mask Colloidal Lithography for the Fabrication of Large‐Area Low‐Cost Plasmonic Multishape Single‐Layer Metasurfaces

By  

ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol. 3, Iss. 5, 2015-05 ,pp. : 680-686

John Wiley & Sons Inc

Access to resources Recommend Favorite