Characterization of dislocations in germanium layers grown on (011)‐ and (111)‐oriented silicon by coplanar and noncoplanar X‐ray diffraction

Publisher： John Wiley & Sons Inc

E-ISSN： 1600-5767|48|3|655-665

ISSN： 0021-8898

Source： JOURNAL OF APPLIED CRYSTALLOGRAPHY (ELECTRONIC), Vol.48, Iss.3, 2015-06, pp. : 655-665

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Characterization of defects in mono‐like silicon for photovoltaic applications using X‐ray Bragg diffraction imaging

By  

JOURNAL OF APPLIED CRYSTALLOGRAPHY (ELECTRONIC), Vol. 48, Iss. 3, 2015-06 ,pp. : 645-654

John Wiley & Sons Inc

Access to resources Recommend Favorite

Temperature‐ and energy‐dependent phase shifts of resonant multiple‐beam X‐ray diffraction in germanium crystals

By  

ACTA CRYSTALLOGRAPHICA SECTION A (ELECTRONIC), Vol. 71, Iss. 4, 2015-07 ,pp. : 460-466

John Wiley & Sons Inc

Access to resources Recommend Favorite

X-ray diffraction and infrared characterization of Oxisols from central and southeastern Brazil

By Nitzsche R. P.   Percival J. B.   Torrance J. K.   Stirling J. A. R.   Bowen J. T.  

Clay Minerals, Vol. 43, Iss. 4, 2008-12 ,pp. : 549-560

Mineralogical Society

Access to resources Recommend Favorite

Diffraction imaging for in situ characterization of double‐crystal X‐ray monochromators

By  

JOURNAL OF APPLIED CRYSTALLOGRAPHY (ELECTRONIC), Vol. 48, Iss. 6, 2015-12 ,pp. : 1734-1744

John Wiley & Sons Inc

Access to resources Recommend Favorite

Signature of dislocations and stacking faults of face‐centred cubic nanocrystals in coherent X‐ray diffraction patterns: a numerical study

By  

JOURNAL OF APPLIED CRYSTALLOGRAPHY (ELECTRONIC), Vol. 48, Iss. 3, 2015-06 ,pp. : 621-644

John Wiley & Sons Inc

Access to resources Recommend Favorite