Influence of the ion synthesis and ion doping regimes on the effect of sensitization of erbium emission by silicon nanoclusters in silicon dioxide films

Author： Korolev D.   Kostyuk A.   Belov A.   Mikhaylov A.   Dudin Yu.   Bobrov A.   Malekhonova N.   Pavlov D.   Tetelbaum D.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7834

Source： Physics of the Solid State, Vol.55, Iss.11, 2013-11, pp. : 2361-2367

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