Niobium nitride films formed by rapid thermal processing (RTP): a study of depth profiles and interface reactions by complementary analytical techniques

Author： Berendes A.   Brunkahl O.   Angelkort C.   Bock W.   Hofer F.   Warbichler P.   Kolbesen B.  

Publisher： Springer Publishing Company

ISSN： 1618-2642

Source： Analytical and Bioanalytical Chemistry, Vol.379, Iss.4, 2004-06, pp. : 554-567

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Oxidation and nitridation of niobium films by rapid thermal processing

By Matylitskaya Volha A.   Bock Wolfgang   Thoma Klaus   Kolbesen Bernd O.  

Microchimica Acta, Vol. 156, Iss. 1-2, 2006-11 ,pp. : 33-37

Springer Publishing Company

Access to resources Recommend Favorite

Nitridation of niobium oxide films by rapid thermal processing

By Matylitskaya V.   Bock W.   Kolbesen B.  

Analytical and Bioanalytical Chemistry, Vol. 390, Iss. 6, 2008-03 ,pp. : 1507-1515

Springer Publishing Company

Access to resources Recommend Favorite

Nitridation of niobium films by rapid thermal processing: different behaviour of films on oxydized silicon and monocrystalline sapphire substrates

By Brunkahl Oliver   Mertens Regine   Bock Wolfgang   Thoma Klaus   Kolbesen Bernd Ottmar  

Microchimica Acta, Vol. 156, Iss. 1-2, 2006-11 ,pp. : 39-51

Springer Publishing Company

Access to resources Recommend Favorite

Annealing of thin B/Nb2N bilayers, B/Nb bilayers and Nb/B/Nb trilayers via rapid thermal processing (RTP)

By Mertens R.   Bock W.   Lommel B.   Kolbesen B.  

Analytical and Bioanalytical Chemistry, Vol. 390, Iss. 6, 2008-03 ,pp. : 1517-1525

Springer Publishing Company

Access to resources Recommend Favorite

IR Study of Amorphous Silicon Nitride Films

By Luongo J. P.  

Applied Spectroscopy, Vol. 38, Iss. 2, 1984-03 ,pp. : 195-199

Society for Applied Spectroscopy

Access to resources Recommend Favorite