Nitridation of niobium films by rapid thermal processing: different behaviour of films on oxydized silicon and monocrystalline sapphire substrates

Author: Brunkahl Oliver   Mertens Regine   Bock Wolfgang   Thoma Klaus   Kolbesen Bernd Ottmar  

Publisher: Springer Publishing Company

ISSN: 0026-3672

Source: Microchimica Acta, Vol.156, Iss.1-2, 2006-11, pp. : 39-51

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