New Simulation Method to Characterize the Recoverable Component of Dynamic Negative-Bias Temperature Instability in p-Channel Metal–Oxide–Semiconductor Field-Effect Transistors

Author: Hussin H.   Soin N.   Bukhori M.F.   Abdul Wahab Y.   Shahabuddin S.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.43, Iss.4, 2014-04, pp. : 1207-1213

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