Metal-oxide-semiconductor AlGaN/GaN heterostructure field-effect transistors using TiN/AlO stack gate layer deposited by reactive sputtering

Publisher: IOP Publishing

E-ISSN: 1361-6641|30|1|15019-15024

ISSN: 0268-1242

Source: Semiconductor Science and Technology, Vol.30, Iss.1, 2015-01, pp. : 15019-15024

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