Nitrogen Plasma Processing of SiO2/4H-SiC Interfaces

Author： Modic A.   Sharma Y.K.   Xu Y.   Liu G.   Ahyi A.C.   Williams J.R.   Feldman L.C.   Dhar S.  

Publisher： Springer Publishing Company

ISSN： 1543-186X

Source： Journal of Electronic Materials, Vol.43, Iss.4, 2014-04, pp. : 857-862

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