Characterization of thin and ultra-thin SiO 2 films and SiO 2 /Si interfaces with combined conducting and topographic atomic force microscopy

Author： Frammelsberger W.   Benstetter G.   Schweinboeck T.   Stamp R.J.   Kiely J.  

Publisher： Elsevier

ISSN： 0026-2714

Source： Microelectronics Reliability, Vol.43, Iss.9, 2003-09, pp. : 1465-1470

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