Publisher: John Wiley & Sons Inc
E-ISSN: 1097-4660|90|6|1040-1050
ISSN: 0268-2575
Source: JOURNAL OF CHEMICAL TECHNOLOGY & BIOTECHNOLOGY, Vol.90, Iss.6, 2015-06, pp. : 1040-1050
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
THE CANADIAN JOURNAL OF CHEMICAL ENGINEERING, Vol. 93, Iss. 5, 2015-05 ,pp. :
Properties of SiO2/4H-SiC Interfaces with an Oxide Deposited by a High-Temperature Process
Materials Science Forum, Vol. 2017, Iss. 897, 2017-06 ,pp. :
Application of magnetic neutral loop discharge plasma to SiO 2 etching process
By Chen W. Hayashi T. Itoh M. Morikawa Y. Sugita K. Uchida T.
Vacuum, Vol. 53, Iss. 1, 1999-05 ,pp. :