Simulation of mesa structures for III-V semiconductors under ion beam etching

Author: Houlet L.   Rhallabi A.   Turban G.  

Publisher: Edp Sciences

E-ISSN: 1286-0050|6|3|273-280

ISSN: 1286-0042

Source: EPJ Applied Physics (The), Vol.6, Iss.3, 2010-03, pp. : 273-280

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Abstract