Effects of oxygen plasma treatment on V th uniformity of recessed-gate AlGaN/GaN HEMTs

Author: Hong Ki-Ha   Choi Hyuk   Hwang Injun   Kim Jongseob  

Publisher: Springer Publishing Company

ISSN: 1738-8090

Source: Electronic Materials Letters, Vol.10, Iss.2, 2014-03, pp. : 363-367

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