Fluorine-plasma surface treatment for gate forward leakage current reduction in AlGaN/GaN HEMTs

Author: Wanjun Chen   Jing Zhang   Bo Zhang   Chen Kevin Jing  

Publisher: IOP Publishing

ISSN: 1674-4926

Source: Journal of Semiconductors, Vol.34, Iss.2, 2013-02, pp. : 24003-24006

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Abstract