Etching behaviour of sputter-deposited aluminium nitride thin films in H3PO4 and KOH solutions

Author: Ababneh A.   Kreher H.   Schmid U.  

Publisher: Springer Publishing Company

ISSN: 0946-7076

Source: Microsystem Technologies, Vol.14, Iss.4-5, 2008-04, pp. : 567-573

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