Use of hydrogen etching to remove existing dislocations in GaN epitaxial layers

Author: YehYen-Hsien   ChuChung-Ming   WuYin-Hao   HsuYing-Chia   YuTzu-Yi   LeeWei-I  

Publisher: IOP Publishing

E-ISSN: 1361-6641|30|8|85002-85007

ISSN: 0268-1242

Source: Semiconductor Science and Technology, Vol.30, Iss.8, 2015-08, pp. : 85002-85007

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