Cleaning Process for Using Chlorine Trifluoride Gas Silicon Carbide Chemical Vapor Deposition Reactor

Publisher： Trans Tech Publications

E-ISSN： 1662-9752|2015|821|125-128

ISSN： 0255-5476

Source： Materials Science Forum, Vol.2015, Iss.821, 2015-07, pp. : 125-128

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Abstract

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