Logistic regression models to predict solvent accessible residues using sequence‐ and homology‐based qualitative and quantitative descriptors applied to a domain‐complete X‐ray structure learning set

Publisher： John Wiley & Sons Inc

E-ISSN： 1600-5767|48|6|1976-1984

ISSN： 0021-8898

Source： JOURNAL OF APPLIED CRYSTALLOGRAPHY (ELECTRONIC), Vol.48, Iss.6, 2015-12, pp. : 1976-1984

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