Related content

A comparative study of O2/SiH4 and N2O/SiH4 mixtures for SiO2 deposition in a microwave afterglow

By  

Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. : C3-241-C3-246

Edp Sciences

Access to resources Recommend Favorite

Anomalous electron-beam-induced excitation of argon in pulsed supersonic streams of Ar+CH₄, Ar+SiH₄, and Ar+ CH₄+SiH₄ mixtures

By Madirbaev V.   Zarvin A.   Korobeishchikov N.   Sharafutdinov R.  

Technical Physics Letters, Vol. 27, Iss. 10, 2001-10 ,pp. : 819-820

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

DOWNSTREAM MICROWAVE PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION OF SiO2 USING O2/SiH4 AND N2O/SiH4 MIXTURES

By  

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-421-C2-428

Edp Sciences

Access to resources Recommend Favorite

Vibrational and thermal averaging of the indirect nuclear spin-spin coupling constants of CH4 , SiH4 , GeH4 and SnH4

By Kirpekar Sheela   Enevoldsen Thomas   Oddershede Jens  

Molecular Physics, Vol. 91, Iss. 5, 1997-08 ,pp. : 897-908

Taylor & Francis Ltd

Access to resources Recommend Favorite

Vibrational dephasing in liquid SiH 4

By Wilde Richard   Chang Ta-Chau  

Molecular Physics, Vol. 53, Iss. 2, 1984-10 ,pp. : 493-504

Taylor & Francis Ltd

Access to resources Recommend Favorite