Fundamental studies on the decomposition mechanism of Ti(OC3H7)4 and TiO2 film evolution on Si(100) and Pt(100) surfaces

Publisher: Edp Sciences

E-ISSN: 1764-7177|11|PR3|Pr3-517-Pr3-524

ISSN: 1155-4339

Source: Le Journal de Physique IV, Vol.11, Iss.PR3, 2001-08, pp. : Pr3-517-Pr3-524

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next