LOW PRESSURE CHEMICAL VAPOR DEPOSITION (CVD) ON OXIDE AND NONOXIDE CERAMIC CUTTING TOOLS

Publisher： Edp Sciences

E-ISSN： 0449-1947|50|C5|C5-423-C5-432

ISSN： 0449-1947

Source： Le Journal de Physique Colloques, Vol.50, Iss.C5, 1989-05, pp. : C5-423-C5-432

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Low pressure chemical vapor deposition of CuxS

By  

Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. : Pr3-239-Pr3-246

Edp Sciences

Access to resources Recommend Favorite

LOW PRESSURE CHEMICAL VAPOR DEPOSITION OF TIN OXIDE THIN FILMS FROM AN ORGANOMETALLIC COMPOUND. APPLICATION TO GAS DETECTION

By  

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-303-C2-310

Edp Sciences

Access to resources Recommend Favorite

Phase controlled low-pressure chemical vapor deposition of iron(di)sulfide

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-425-Pr8-430

Edp Sciences

Access to resources Recommend Favorite

Hafnium carbide as a barrier in multilayer coatings by chemical vapor deposition (CVD)

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-509-Pr8-516

Edp Sciences

Access to resources Recommend Favorite

Nucleation of GaSb on GaAs (001) by low pressure metal—organic chemical vapor deposition

By Lian-Kai Wang   Ren-Jun Liu   Hao-Yu Yang   You Lü   Guo-Xing Li   Yuan-Tao Zhang   Bao-Lin Zhang  

Chinese Physics B, Vol. 23, Iss. 8, 2014-08 ,pp. : 88110-88116

IOP Publishing

Access to resources Recommend Favorite