Optimization of Fluorine Plasma Treatment for Interface Improvement on HfO₂/In_0.53Ga_0.47As MOSFETs

Author： Chen Yen-Ting Wang Yanzhen Lee Jack C.

Publisher： MDPI

E-ISSN： 2076-3417|2|1|233-244

ISSN： 2076-3417

Source： Applied Sciences, Vol.2, Iss.1, 2012-03, pp. : 233-244

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