Application of Si-Vapor Ambient Anneal for Post Ion Implantation Anneal and Simultaneous Improvement of Trench Sidewall Smoothness

Publisher: Trans Tech Publications

E-ISSN: 1662-9752|2018|924|345-348

ISSN: 0255-5476

Source: Materials Science Forum, Vol.2018, Iss.924, 2018-07, pp. : 345-348

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Abstract