Annealing temperature influence on the degree of inhomogeneity of the Schottky barrier in Ti/4H—SiC contacts

Publisher: IOP Publishing

E-ISSN: 1741-4199|23|12|127302-127306

ISSN: 1674-1056

Source: Chinese Physics B, Vol.23, Iss.12, 2014-12, pp. : 127302-127306

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