A study on reactive ion etching lag of a high aspect ratio contact hole in a magnetized inductively coupled plasma

Publisher: IOP Publishing

E-ISSN: 1361-6595|23|6|65051-65066

ISSN: 0963-0252

Source: Plasma Sources Science and Technology, Vol.23, Iss.6, 2014-12, pp. : 65051-65066

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Abstract