Author： Joo Young-Hee Woo Jong-Chang Yang Xue Kim Chang-Il
Publisher： Taylor & Francis Ltd
ISSN： 0015-0193
Source： Ferroelectrics, Vol.406, Iss.1, 2010-01, pp. : 176-184
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Access to resources
Recommend
Characterization of H2O- inductively coupled plasma for dry etching
Journal of Physics: Conference Series , Vol. 100, Iss. 6, 2008-03 ,pp. :
Access to resources
A study of GaN-based LED structure etching using inductively coupled plasma
Journal of Physics: Conference Series , Vol. 276, Iss. 1, 2011-02 ,pp. :
By Hong J. Lambers E. S. Abernathy C. R. Pearton S. J. Shul R. J. Hobson W. S.
Critical Reviews in Solid State and Material Sciences, Vol. 23, Iss. 4, 1998-12 ,pp. :
Inductively-coupled dusty plasma
Le Journal de Physique IV, Vol. 10, Iss. PR5, 2000-03 ,pp. :