PECVD silicon-rich nitride and low stress nitride films mechanical characterization using membrane point load deflection

Author： Bagolini Alvise   Picciotto Antonino   Crivellari Michele   Conci Paolo   Bellutti Pierluigi  

Publisher： IOP Publishing

E-ISSN： 1361-6439|26|2|25004-25011

ISSN： 0960-1317

Source： Journal of Micromechanics and Microengineering, Vol.26, Iss.2, 2016-02, pp. : 25004-25011

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