Integrated approach for low-temperature synthesis of high-quality silicon nitride films in PECVD using RF–UHF hybrid plasmas

Author： Sahu B B   Shin Kyung S   Han Jeon G  

Publisher： IOP Publishing

E-ISSN： 1361-6595|25|1|15017-15030

ISSN： 0963-0252

Source： Plasma Sources Science and Technology, Vol.25, Iss.1, 2016-02, pp. : 15017-15030

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