Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride

Author： Shimizu T Villamayor M Lundin D Helmersson U

E-ISSN： 1361-6463|49|6|65202-65209

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.49, Iss.6, 2016-02, pp. : 65202-65209

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

A parametric model for reactive high-power impulse magnetron sputtering of films

By Kozák Tomáš Vlček Jaroslav

Journal of Physics D: Applied Physics, Vol. 49, Iss. 5, 2016-02 ,pp. : 55202-55219

IOP Publishing

Access to resources Recommend Favorite

On reactive high power impulse magnetron sputtering

By Gudmundsson J T

Plasma Physics and Controlled Fusion, Vol. 58, Iss. 1, 2016-01 ,pp. : 14002-14009

IOP Publishing

Access to resources Recommend Favorite

Synthesis of $\alpha$-Al$_2$O$_3$ thin films using reactive high-power impulse magnetron sputtering

EPL (EUROPHYSICS LETTERS), Vol. 82, Iss. 3, 2008-05 ,pp. : 36002-36002

Edp Sciences

Access to resources Recommend Favorite

Effect of the target power density on high-power impulse magnetron sputtering of copper

By Kozák Tomáš

Plasma Sources Science and Technology, Vol. 21, Iss. 2, 2012-04 ,pp. : 25012-25023

IOP Publishing

Access to resources Recommend Favorite

Effect of voltage pulse characteristics on high-power impulse magnetron sputtering of copper

By Kozák Tomáš Vlček Jaroslav

Plasma Sources Science and Technology, Vol. 22, Iss. 1, 2013-02 ,pp. : 15009-15017

IOP Publishing

Access to resources Recommend Favorite