Evolution of high aspect ratio and nano-grass structures using a modified low plasma density reactive ion etching

By Mehran M.   Kolahdouz Z.   Sanaee Z.   Azimi S.   Mohajerzadeh S.  

EPJ Applied Physics (The), Vol. 55, Iss. 1, 2011-07 ,pp. : 11302-11302

Edp Sciences

Access to resources Recommend Favorite

Suppression of leakage currents in GaN-based LEDs induced by reactive-ion etching damages

By Mosca M.   Castiglia A.   Bühlmann H.-J.   Dorsaz J.   Feltin E.   Carlin J.-F.   Grandjean N.  

EPJ Applied Physics (The), Vol. 43, Iss. 1, 2008-06 ,pp. : 51-53

Edp Sciences

Access to resources Recommend Favorite

Optimization of reactive-ion etching (RIE) parameters for fabrication of tantalum pentoxide (Ta₂O₅) waveguide using Taguchi method

By Muttalib M. Firdaus A.  

EPJ Web of Conference, Vol. 162, Iss. issue, 2017-11 ,pp. : 01003-01003

Edp Sciences

Access to resources Recommend Favorite

The analitical modeling of the motion process of the inverted pendulum system

By  

MATEC Web of conference, Vol. 132, Iss. issue, 2017-10 ,pp. : 02012-02012

Edp Sciences

Access to resources Recommend Favorite

Reactive etching of SiC by energetic CF₃: molecular dynamics simulation

By Gou F.   Chen Z.   Zhiqian C.  

EPJ Applied Physics (The), Vol. 38, Iss. 2, 2007-03 ,pp. : 129-134

Edp Sciences

Access to resources Recommend Favorite