A Comprehensive Approach Towards Optimizing the Xenon Plasma Focused Ion Beam Instrument for Semiconductor Failure Analysis Applications

Publisher： Cambridge University Press

E-ISSN： 1435-8115|23|4|769-781

ISSN： 1431-9276

Source： Microscopy and Microanalysis, Vol.23, Iss.4, 2017-06, pp. : 769-781

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