Author: Ritala M. Riihela D. Matero R. Leskela M.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.289, Iss.1, 1996-11, pp. : 250-255
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Atomic layer deposition of BN thin films
By Marlid B. Ottosson M. Pettersson U. Larsson K. Carlsson J.-O.
Thin Solid Films, Vol. 402, Iss. 1, 2002-01 ,pp. :
Effect of water dose on the atomic layer deposition rate of oxide thin films
By Matero R. Rahtu A. Ritala M. Leskela M. Sajavaara T.
Thin Solid Films, Vol. 368, Iss. 1, 2000-06 ,pp. :
Properties of tantalum oxide thin films grown by atomic layer deposition
By Kukli K. Aarik J. Aidla A. Kohan O. Uustare T. Sammelselg V.
Thin Solid Films, Vol. 260, Iss. 2, 1995-05 ,pp. :