Study on the correlation between dielectric constant and chemical shift in FTIR spectra of SiOC film by chemical vapor deposition after annealing

Publisher： John Wiley & Sons Inc

E-ISSN： 1610-1642|7|2|448-451

ISSN： 1862-6351

Source： PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol.7, Iss.2, 2010-02, pp. : 448-451

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