Chemical-mechanical polishing of SiOC organosilicate glasses: the effect of film carbon content

Author: Borst C.L.   Korthuis V.   Shinn G.B.   Luttmer J.D.   Gutmann R.J.   Gill W.N.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.385, Iss.1, 2001-04, pp. : 281-292

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Abstract