An amorphous SiCOF film with low dielectric constant prepared by plasma-enhanced chemical vapor deposition

Author： Wang P.-F. Ding S.-J. Zhang D.W. Wang J.-T. Lee W.W.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.385, Iss.1, 2001-04, pp. : 115-119

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