Effect of annealing treatment on the photocatalytic activity of TiO2 thin films deposited by dc reactive magnetron sputtering

By  

Journal of Physics: Conference Series , Vol. 614, Iss. 1, 2015-07 ,pp. : 44-49

IOP Publishing

Access to resources Recommend Favorite

Preparation and characterization of Gd2O3-doped HfO2 high-k gate dielectric thin films by RF sputtering

By  

Journal of Physics: Conference Series , Vol. 152, Iss. 1, 2009-03 ,pp. : 27-31

IOP Publishing

Access to resources Recommend Favorite

Preparation and characterization of HfO$_{2}$ thin films byphoto-assisted MOCVD

By  

Le Journal de Physique IV, Vol. 132, Iss. issue, 2006-03 ,pp. : 279-283

Edp Sciences

Access to resources Recommend Favorite

Structures and properties of Y-ZrO2 thin films deposited by reactive r.f. sputtering

By  

Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. : C3-611-C3-615

Edp Sciences

Access to resources Recommend Favorite

HfO2-TiO2 Ultra-Thin Gate Dielectric by RF Sputtering

By Li G. X.   Chen X. F.   Ren W.   Shi P.   Wu X. Q.   Tan O. K.   Zhu W. G.   Yao X.  

Ferroelectrics, Vol. 410, Iss. 1, 2011-01 ,pp. : 129-136

Taylor & Francis Ltd

Access to resources Recommend Favorite