Processing chemically amplified resists on advanced photomasks using a thermal array

Author: Schaper C.D.   El-Awady K.   Kailath T.   Tay A.   Lee L.L.   Ho W.-K.   Fuller S.E.  

Publisher: Elsevier

ISSN: 0167-9317

Source: Microelectronic Engineering, Vol.71, Iss.1, 2004-01, pp. : 63-68

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