BCl 3 /Ne etching of III-V semiconductors in a planar inductively coupled plasma reactor

Author： Lim W.T. Baek I.K. Lee J.W. Lee E.S. Jeon M.H. Cho G.S. Pearton S.J.

Publisher： Elsevier

ISSN： 0169-4332

Source： Applied Surface Science, Vol.222, Iss.1, 2004-01, pp. : 74-81

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